Blank Cover Image

Cleaning for Sub 0.1 μm Technology: A Particular Challenge*

Author(s):
Knotter, D.M.  
Publication title:
ULSI Process Integration : proceedings of the International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-6
Pub. Year:
2003
Page(from):
349
Page(to):
360
Pages:
12
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773768 [1566773768]
Language:
English
Call no.:
E23400/200306
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Ultra Shallow Junctions for Sub 0.1 Micron Technologies and Beyond

Monsoon, M.M., Jam, A., Mercer, D.E., Robertson, L., Kohli, P.

Electrochemical Society
7 Conference Proceedings Analysis of Non-Stationary Transport and Quantum Effects in Realistic 0.1 μm Partially-Depleted SOI Technology

Munteanu, D., Le Carval, G., Fenouillet-Bcranger, C.

Electrochemical Society
2 Conference Proceedings Sub-0.1μm optical track width measurement [5858-22]

Smith, R. J., See, C. W., Somekh, M. G., Yacoot, A.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Super Self-Aligned Processing for Sub 0.1 μm MOS Devices Using Selective Si l-xGexCVD

Kikuchi, T., Yamashiro, T., Moriya, A., Noda, T., Yamamoto, Y., Deng, C., Sakuraba, M., Matsuura, T., Murota, J.

Electrochemical Society
3 Conference Proceedings Short channel effects in sub 0.1 μm SOI-MOSFETs

Rauly, E., Balestra, F.

Electrochemical Society
9 Conference Proceedings CMP Applications for Sub-0.25μm Process Technologies

Pramanik, D., Weling, M., Lin, X.-W.

Electrochemical Society
4 Conference Proceedings Optical microscopy at sub-0.1-μm resolution for semiconductor applications

Vollrath,W.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Effects of the Silicon Nitride Passivation on the DC and RF Performance of 0.1μm Pseudomorphic pHEMTs

Oh, J-H., Sul, W-S., Han, H-J., Son, M-S., Rhee, J.-K., Kim, S-D.

Electrochemical Society
5 Conference Proceedings Doping Process Issues for Sub-0.1 μm Generation MOSFETs

Sugii, Toshihiro, Pidin, Sergey, Momiyama, Youichi, Goto, Ken-ichi, Tanaka, Takuji, Yamamoto, Tomonari, Futatugi, …

Materials Research Society
11 Conference Proceedings 0.1 μm AlGaAs/InGaAs HEMT Fabrication by UV-Lithography

Tanabe, M., Matsuno, T., Sakai, H., Yanagihara, M., Inoue, K., Tamura, A.

Electrochemical Society
6 Conference Proceedings Fabrication And Performance Limits Of Sub-0.1 μm Cu Interconnects

Kuan, T., Inoki, C., Oehrlein, G., Rose, K., Zhao, Y., Wang, G., Rossnagel, S., Cabral, C.

Materials Research Society
12 Conference Proceedings Alternating phase shifting mask implementation to 0.1-μm logic gates

Chang,C.-H., Tzu,S.-D., Hsieh,C.-H., Dai,C.M., Lin,B.J., Lin,C.-H., Liu,H.-Y.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12