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Plasma Technologies for Low-k Dry Etching*

Author(s):
Tatsumi, T.  
Publication title:
ULSI Process Integration : proceedings of the International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-6
Pub. Year:
2003
Page(from):
206
Page(to):
216
Pages:
11
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773768 [1566773768]
Language:
English
Call no.:
E23400/200306
Type:
Conference Proceedings

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