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Spectroscopic Ellipsometry in the VUV Range Applied to the Characterization of Atomic Layer Deposited HfO2, A1203 and HfAIOx Thin Layers for High k Dielectrics

Author(s):
Publication title:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-3
Pub. Year:
2003
Page(from):
305
Page(to):
315
Pages:
11
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773485 [1566773482]
Language:
English
Call no.:
E23400/200303
Type:
Conference Proceedings

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