Blank Cover Image

Low-Temperature Oxidation for Gate Dielectrics of Poly-Si TFTs using High-Density Surface Wave Plasma

Author(s):
Publication title:
Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-2
Pub. Year:
2003
Page(from):
614
Page(to):
621
Pages:
8
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773478 [1566773474]
Language:
English
Call no.:
E23400/200302
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Low-Temperature Microwave Plasma Oxidation for Gate Dielectrics of Poly-Si TFTs using High-Density Surface Wave Plasma Invited Paper

Azuma, K.

Electrochemical Society
7 Conference Proceedings Polysilicon TFTs for AMLCD applications with gate oxides grown in a low-temperature N2O plasma

Howell,R.S., Kaluri,S.R., Hatalis,M.K., Hess,D.W.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Low-Temperature-Proceeded Gate Insulator for Poly-Si TFTs by Combination of Photo-Oxidation and PECVD

Nakata, Y., Okamoto, T., Goto, M., Azuma, K.

Electrochemical Society
8 Conference Proceedings High Quality Thin Gate Dielectric Using ECR N2O-Plasma for Future Poly-Si TFT Applications

Lee, J.W., Lee, N.I., Han, C.H.

Electrochemical Society
3 Conference Proceedings HIGH QUALITY GATE-OXIDE FILMS FOR LOW-TEMPERATURE FABRICATED POLY-Si TFTS

Suyama, Shiro, Okamoto, Akio, Shirai,m Seiiti, Serika, Tadashi

Materials Research Society
9 Conference Proceedings High Quality Gate Insulator for Very-Low Temperature Poly-Si TFT Employing Nitrous Oxygen Plasma Pre-Treatment

Shin, Moon Young, Han, Sang-Myeon, Lee, Min-Cheol, Shin, Hee-Sun, Han, Min-Koo, Kwon, Jang-Yeon, Noguchi, Takashi

Materials Research Society
4 Conference Proceedings Low-Temperature Formation of Gate-Grade Silicon Oxide Films Using High-Density Krypton Plasma

Saito, Y., Sekine, K., Hirayama, M., Ohmi, T.

Electrochemical Society
10 Conference Proceedings Low Temperature Poly-Si TFT Technology

Noguchi, T., Kim, D.Y., Kwon, J.Y., Park, K.B., Jung, J.S., Xianyu, W.X., Yin, H.X., Cho, H.S.

Materials Research Society
5 Conference Proceedings High-Quality Low-Temperature Gate Oxide for Poly-Si TFTs*

Okumura, F., Yuda, K.

Electrochemical Society
11 Conference Proceedings Controlling the Amount of Si-OH Bonds for the Formation of High-Quality Low-Temperature Gate Oxides for Poly-Si TFTs

Yuda, Katsuhisa, Tanabe, Hiroshi, Sera, Kenji, Okumura, Fujio

MRS - Materials Research Society
6 Conference Proceedings Development of line-shaped optical system for YAG2ω laser annealing used in the manufacture of low-temperature poly-Si TFT

Okamoto, T., Morikawa, K., Sono, A., Sato, Y., Nishimae, J.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings High Quality TEOS Silicon Oxide Deposited at Low Temperature for TFT Gate Dielectric Application

Morimoto, N.I., Viana, C.E., da Silva, A.N.R.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12