Ultrathin Silicon Oxynitride Gate Dielectrics

Ultrathin Silicon Oxynitride Gate Dielectrics

Author(s):

Publication title:

Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2003-2

Pub. Year:

2003

Page(from):

465

Page(to):

475

Pages:

11

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773478 [1566773474]

Language:

English

Call no.:

E23400/200302

Type:

Conference Proceedings

Details

TDL ID:	ZA00014065
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
Conf. info. (Number):	7th
Conf. info. (Venue):	Paris, France
Conf. info. (Date):	2003.04.28-2003.05.02

Similar Items:

1 Conference Proceedings Material and Process Considerations of Ultra thin Silicon (Oxy) Nitride Films Grown on Silicon and SiO2 Surfaces D'Emic, C.P., Gusev, E.P., Chan, K.K., Zabel, T., Copel, M., Murphy, R., Kozolowski, P., Newbury, J. Electrochemical Society	7 Conference Proceedings Hyperthermal Nitridation for Ultrathin Silicon Oxynitride Gate Dielectrics Krug, C., Baumvol, I.J.R., Stedile, F.C., Green, M.L., Klemens, F., Silverman, P.J., Sorsch, T.W., Alvarez, F., Hammer, … Electrochemical Society
2 Conference Proceedings Processing and Characterization of RTCVD Silicon Nitride and Oxynitride Grown in a Single-Wafer RT Cluster Tool D'Emic, C.P., Gusev, E.P., Newbury, I., Kozlowski, P., Chan, K., Zabel, T., Varekamp, P. Electrochemical Society	8 Conference Proceedings Electrical and physical characterization of ultrathin silicon oxynitride gate dielectric films formed by the jet vapor deposition technique Karamcheti, A., Watt, V. H. C., Luo, T. Y., Brady, D., Shaapur, F., Vishnubhotla, L., Gale, G., Huff, H. R., Jackson, M. … MRS-Materials Research Society
3 Conference Proceedings 28 Growth and characterization of Al2O3:HfO2 nanolaminate films deposited by Atomic Layer Deposition D'Emic, C.P., Gusev, E.P., Copel, M., Newbury, I., Unvel, H., Kozlowski, P., Bruley, J., Murphy, R. Electrochemical Society	9 Conference Proceedings Effects of Wafer Cleaning Reduction on Metals Removal and Ultrathin Gate Oxide Quality D'Emic, Christopher P., Cohen, Stephan, Zaitz, Mary Ann MRS - Materials Research Society
4 Conference Proceedings * Ultra Thin High-K Dielectrics Grown by Atomic Layer Deposition: A Comparative Study of ZrO2, HfO2, Y2O3 and Al2O3 Gusev, E.P., Canter, E., Copel, M., Gribelyuk, M., Buchanan, D.A., Okorn-Schmidt, H., D'Emic, C., Kozlowski, P., … Electrochemical Society	10 Conference Proceedings Material and Integration Issues for Rare Earth Silicides as Gate and Diffusion Contacts in Advanced CMOS Technologies C.P. D'Emic, K. Ohuchi, C. Murray, C. Lavoie, C. Scerbo Electrochemical Society
5 Conference Proceedings Physical Characterization of Ultrathin Films of High Dielectric Constant Materials on Silicon Gusev, E.P., Copel, M., Cartier, E., Buchanan, D., Okorn-Schmidt, H., Cribelyuk, M.A., Falcon, D., Murphy, R., Molis, … Electrochemical Society	11 Conference Proceedings Characterization of Bulk and Interface Properties of Dielectric Layers and Stacks Okorn-Schmidt, H.F., Gusev, E.P., Buchanan, D.A., Cartier, E., Guha, S., Bojarczuk, N.A., Rath, D.L., Callegari, A., … Electrochemical Society
6 Conference Proceedings INVITED: NITROGEN ENGINEERING OF ULTRATHIN SILICON OXYNITRIDES Green, M.L., Gusev, E.P., Lu, H., Garfunkel, E., Gustafsson, T., Lennard, W.N. Electrochemical Society	12 Conference Proceedings Silicides for 22nm and Beyond P.R. Besser, C. Lavoie, C. Murray, C.P. D'Emic, K. Ohuchi Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12