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HfO2 Thin Films Deposited On SOT by Ion Beam Enhanced Deposition

Author(s):
  • Tao, K. ( (Institute of Microsystem and Information Technology, Chinese Academy of Science) )
  • Yu, Y. ( (Institute of Microsystem and Information Technology, Chinese Academy of Science) )
Publication title:
Dielectrics in emerging technologies : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-1
Pub. date:
2003
Page(from):
367
Page(to):
373
Pages:
7
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773461 [1566773466]
Language:
English
Call no.:
E23400/200301
Type:
Conference Proceedings

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