Surface Structure of Hydrogen Annealed Silicon Wafer Using Ozonized Water and Dilute HF Cleaning

Surface Structure of Hydrogen Annealed Silicon Wafer Using Ozonized Water and Dilute HF Cleaning

Author(s):

Kurita, H.

Publication title:

High purity silicon VII : proceedings of the international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2002-20

Pub. Year:

2002

Page(from):

155

Page(to):

170

Pages:

16

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773447 [156677344X]

Language:

English

Call no.:

E23400/200220

Type:

Conference Proceedings

Details

TDL ID:	ZA00014053
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on High Purity Silicon ; Meeting of the Electrochemical Society
Conf. info. (Number):	7th ; 202nd
Conf. info. (Venue):	Salt Lake City, Utah, USA
Conf. info. (Date):	2002.10.20-2002.10.25

Similar Items:

1 Conference Proceedings SINGLE-WAFER SPIN CLEANING WITH REPETITIVE USE OF OZONIZED WATER AND DILUTED HF ('SCROD') Osaka, T., Okamoto, A., Kuniyasu, H., Hattori, T. Electrochemical Society	7 Conference Proceedings Effect of Light Irradiation on Metal Adherence to Si Wafer Surface in Dilute HF Solution Asako, K., Tsuda, N., Takenaka, T. Electrochemical Society
2 Conference Proceedings Hydrogen Annealing of Silicon Wafer Samata, S., Numano, M., Amai, T., Matsushita, Y., Kobayashi, K., Yamamoto, A., Kawaguchi, T., Nadahara, S., Yamabe, K. Electrochemical Society	8 Conference Proceedings ANALYSIS OF THE HF-ETHANOL CLEANING PROCESS ON SILICON WAFERS WITH 100 VICINAL SURFACES Portillo, J., Gual, J., Sarrabayrouse, G., Morante, J. R. MRS - Materials Research Society
3 Conference Proceedings STUDY OF THE CLEANING CONTROL USING A MEGAHERTZ NOZZLE SOUND PRESSURE MONITOR SYSTEM FOR SINGLE-PLATE SPIN CLEANERS Fujita, H., Hayamizu, N., Goshizono, T., Sakurai, N. Electrochemical Society	9 Conference Proceedings Single Wafer Non-Contact Post-CMP Cleaning Using DI Water and Dilute Chemistry Busnaina, A.A., Moumen, N, Piboontum, J. Electrochemical Society
4 Conference Proceedings CONTAMINATION REMOVAL BY SINGLE-WAFER SPIN CLEANING WITH REPETITIVE USE OF OZONATED WATER IN DILUTE HF Osaka, T., Okamoto, A., Kuniyasu, H., Hattori, T. Electrochemical Society	10 Conference Proceedings Influence of Rapid Thermal Annealing on Thermal Donor Formation and Oxygen Precipitation in Czochralski Silicon Takeno, H., Aihara, K., Hayamizu, Y., Masui, T., Suezawa, M. Electrochemical Society
5 Conference Proceedings The Influence of HF, 0H, and Dissolved 02 on Silicon Surface Chemical Cleaning Higashi, G.S., Chabal, Y.J., Raghavachari, K., Becker, R.S., Green, M.P., Hanson, K., Boone, T., Eisenberg, J.H., Shive, … Electrochemical Society	11 Conference Proceedings Development of a Modified Silicon Wafer Clean to Improve Lifetime Hackenberg, D.L., Butler, B.J., Cameron, R.C., Linn, J.H., Lobmeyer, R.N., McNamara, J.M., Pasqua, R.V., Rafie, S., … Electrochemical Society
6 Conference Proceedings CLEANING OF SILICON SURFACE AFTER RIE USING UV/OZONE AND HF/CH3OH Hwang, D.K., Ruzyllo, J., Kamieniecki, E. Electrochemical Society	12 Conference Proceedings Novel analytical applications of μ-PCD and CZE in ultra clean Si-technologies. II. Controlling anions in ultra pure water and on silicon wafer surfaces with CZE Fabry, L., Pahlke, S., Kotz, L., Ehmann, T., Boden, J., Baechmann, K. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12