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Low temperature Doping of Silicon by Hydrogen Plasma Treatments*

Author(s):
Job, R.
Ulyashin, A.G.
Ma, Y.
Fahnwr, W.R.
Simoen, E.
Rafi, J.M.
Claeys, C.
Niedernostheide, F.J.
Schulze, H.J.
4 more
Publication title:
High purity silicon VII : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2002-20
Pub. date:
2002
Page(from):
141
Page(to):
154
Pages:
14
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773447 [156677344X]
Language:
English
Call no.:
E23400/200220
Type:
Conference Proceedings

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