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Effect of Oxygen and Nitrogen Additions on Silicon Nitride Reactive Ion Etching in Fluorine Containing Plasmas

Author(s):
Publication title:
Plasma processing XIV : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2002-17
Pub. Year:
2002
Page(from):
263
Page(to):
276
Pages:
14
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773416 [1566773415]
Language:
English
Call no.:
E23400/200217
Type:
Conference Proceedings

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