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Measurement of Device Charging Damage in a Dielectric Etch 300 mm Chamber with a Bias Voltage Diagnostic Cathode

Author(s):
Publication title:
Plasma processing XIV : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2002-17
Pub. Year:
2002
Page(from):
191
Page(to):
198
Pages:
8
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773416 [1566773415]
Language:
English
Call no.:
E23400/200217
Type:
Conference Proceedings

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