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A Study of Boron Diffusion from Selectively Grown Epitaxial Silicon-Germanium into Silicon During Rapid Thermal Annealing

Author(s):
Yang, T.H.
Chang, E.Y.
Chen, K.M.
Chien, C.H.
Huang, H.J.
Yang, T.Y.
Chang, C.Y.
2 more
Publication title:
Rapid thermal and other short-time processing technologies III : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2002-11
Pub. Year:
2002
Page(from):
371
Page(to):
380
Pages:
10
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773348 [1566773342]
Language:
English
Call no.:
E23400/200211
Type:
Conference Proceedings

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