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Stability of Ultra-Shallow Junctions Formed by 0.2 keV Boron Implantation and Spike Annealing

Author(s):
ang, J. Bennett
L., Larsen
I., Rusakova
H., Chen
J., Lia
W.-K., Chu
Shao, L.
Wang, X.
Bennett, J.
Larsen, L.
Rusakova, I.
Chen, H.
Lia, J.
Chu, W.-K.
9 more
Publication title:
Rapid thermal and other short-time processing technologies III : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2002-11
Pub. Year:
2002
Page(from):
333
Page(to):
338
Pages:
6
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773348 [1566773342]
Language:
English
Call no.:
E23400/200211
Type:
Conference Proceedings

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