Novel HfSiON Gate Dielectric for Advanced CMOS Devices
- Author(s):
Colombo, L. Visokay, M.R. Chambers, J.J. Rotondaro, A.L.P. Shanware, A. Bevan, M.J. Bu, H. Tsung, L. - Publication title:
- Rapid thermal and other short-time processing technologies III : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2002-11
- Pub. Year:
- 2002
- Page(from):
- 199
- Page(to):
- 206
- Pages:
- 8
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773348 [1566773342]
- Language:
- English
- Call no.:
- E23400/200211
- Type:
- Conference Proceedings
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