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INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION

Author(s):
Tsai, W.
Chen, I.
Carter, R.
Cartier, E.
Kluth, J.
Richard, O.
Claes, M.
Lin, Y.M.
Nohira, H.
Conard, T.
Caymax, M.
Young, E.
Vandervorst, W.
DeGendt, S.
Heyns, M.
Manabe, Y.
Maes, J.W.
Rittersma, Z.M.
Besling, W.
Roozeboom, F.
15 more
Publication title:
Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2002-2
Pub. date:
2002
Page(from):
747
Page(to):
760
Pages:
14
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773744 [1566773741]
Language:
English
Call no.:
E23400/2002-2
Type:
Conference Proceedings

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