MODELLING OF CRYSTAL ORIGINATED PARTICLES AND THEIR IMPACT ON GATE OXIDE INTEGRITY

MODELLING OF CRYSTAL ORIGINATED PARTICLES AND THEIR IMPACT ON GATE OXIDE INTEGRITY

Author(s):

Bearda, T.

Publication title:

Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2002-2

Pub. Year:

2002

Page(from):

528

Page(to):

539

Pages:

12

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773744 [1566773741]

Language:

English

Call no.:

E23400/2002-2

Type:

Conference Proceedings

Details

TDL ID:	ZA00014036
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Silicon Materials Science and Technology
Conf. info. (Number):	9th
Conf. info. (Venue):	Philadelphia, PA, USA
Conf. info. (Date):	2002.05.13-2002.05.17

Similar Items:

1 Conference Proceedings MODELLING OF CRYSTAL ORIGINATED PARTICLES AND THEIR IMPACT ON GATE OXIDE INTEGRITY Bearda, T., Mertens, P.W., Woerlee, P.H., Wallinga, H., Sebmolke, R., Heyns, M. Electrochemical Society	7 Conference Proceedings Effect of Cl in Gate Oxidation Mertens, P. W., McGeary, M. J., Schaekers, M., Sprey, H., Vermeire, B., Depas, M., Meuris, M., Heyns, M. M. MRS - Materials Research Society
2 Conference Proceedings Effect of Substrate Defects on GOI of Ultra-Thin Gate Oxides Bearda, T.R., Vanhellemont, J., Mertens, P.W., Heyns, M. Electrochemical Society	8 Conference Proceedings Effect of Metal Contamination and Improved Cleaning Strategies Mertens, P.W., Bearda, T., Lowewenstein, L.M., Martin, A.R., Hub, W., Kolbesen, B.O., Teerlink, I., Vos, R., Baeyens, … Electrochemical Society
3 Conference Proceedings CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY Mertens, P.W., Meuris, M., Schmidt, H.F., Verhaverbeke, S., Heyns, M.M., Carr, P., Graeff, D., Schnegg, A., Kubota, M., … Electrochemical Society	9 Conference Proceedings REDUCTION OF SURFACE METALLIC CONTAMINATION THROUGH OPTIMIZED RINSING AND SINGLE-WAFER DRYING Fyen, W., Holsteyns, F., Lauerhaas, J., Bearda, T., Mertens, P., Heyns, M. Electrochemical Society
4 Conference Proceedings Modeling Soft Breakdown of Ultrathin Gate Oxide Layers Houssa, M., Mertens, P. W., Heyns, M. M. MRS - Materials Research Society	10 Conference Proceedings Critical Processes for Ultrathin Gate Oxide Integrity Depas, M., Heyns, M.M., Nigam, T., Kenis, K., Sprey, H., Wilhelm, R., Crossley, A., Sofield, C.J., Graef, D. Electrochemical Society
5 Conference Proceedings INVITED: WAFER CLEANING: A QUANTIFIABLE PROCESS STEP Mertens, P.W., Loewenstein, L., Vos, R., De Gendt, S., Bearda, T., Heynes, M.M. Electrochemical Society	11 Conference Proceedings ELECTRICAL PROPERTIES OF METAL-INSULATOR-SEMICONDUCTOR DEVICES WITH HIGH PERMITTIVITY GATE DIELECTRIC LAYERS HOUSSA, M., MERTENS, P.W., HEYNS, M.M., STESMANS, A. Kluwer Academic Publishers
6 Conference Proceedings Effect of Cl in Gate Oxidation Mertens, P. W., McGeary, M. J., Schaekers, M., Sprey, H., Vermeire, B., Depas, M., Meuris, M., Heyns, M. M. MRS - Materials Research Society	12 Conference Proceedings Crystal originated particles (COPs), bulk defects including the OSF ring, gate oxide integrity (GOI), and DRAM yield Rozgonyi, G., Tamatsuka, M., Bae, K.-M., Gonzales, F. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12