MICROROUGHNESS ANALYSIS OF SILICON WAFERS USING ULTRAVIOLET RAMAN MICROSCOPY
- Author(s):
- Publication title:
- Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2002-2
- Pub. Year:
- 2002
- Page(from):
- 906
- Page(to):
- 911
- Pages:
- 6
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773744 [1566773741]
- Language:
- English
- Call no.:
- E23400/2002-2
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
MICROROUGHNESS ANALYSIS OF SILICON WAFERS USING ULTRAVIOLET RAMAN MICROSCOPY
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
STUDY ON GEOMETRY, SURFACE DAMAGE AND RAPID THERMAL ANNEALING OF 300mm AS-CUT SILICON WAFERS
Electrochemical Society |
Electrochemical Society |
3
Conference Proceedings
STUDY ON GEOMETRY, SURFACE DAMAGE AND RAPID THERMAL ANNEALING OF 300mm AS-CUT SILICON WAFERS
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
5
Conference Proceedings
Study of field distribution of the probes in scanning near-field optical microscopy using finite-difference time-domain calculations
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Narrow stripe selective growth of InGaAlAs waveguides used for buried heterostructure lasers [6321-20]
SPIE - The International Society of Optical Engineering |