In Situ PRE-EPI CLEAN PROCESS FOR NEXT GENERATION DEVICES
- Author(s):
- Publication title:
- Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2001-26
- Pub. Year:
- 2001
- Page(from):
- 345
- Page(to):
- 351
- Pages:
- 7
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773591 [1566773598]
- Language:
- English
- Call no.:
- E23400/200126
- Type:
- Conference Proceedings
Similar Items:
Electrochemical Society |
Electrochemical Society |
2
Conference Proceedings
PERFORMANCE OF AN ADVANCED FRONT OF THE LINE CLEAN COMPARED TO THE PROCESS OF RECORD CLEAN IN A MANUFACTURING ENVIRONMENT
Electrochemical Society |
Electrochemical Society |
3
Conference Proceedings
Immersion system process optimization for 248-nm and 193-nm photomasks: binary and EAPSM
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
MRS - Materials Research Society |
10
Conference Proceedings
THE ROLE OF MEGASONIC ENERGY IN PARTICULATE REMOVAL FROM SILICON SUBSTRATES IN DILUTE SC1 CHEMISTRY
Electrochemical Society |
Electrochemical Society |
11
Conference Proceedings
AUV5500: advanced in situ dry cleaning and metrology process for next generation lithography [5853-31]
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
American Institute of Chemical Engineers |