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EFFECT OF H2O2 AND IPA ADDITION IN DILUTE HF SOLUTION ON SURFACE ETCHING AND PARTICLE REMOVAL EFFICIENCY

Author(s):
Publication title:
Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-26
Pub. date:
2001
Page(from):
156
Page(to):
163
Pages:
8
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773591 [1566773598]
Language:
English
Call no.:
E23400/200126
Type:
Conference Proceedings

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