Blank Cover Image

SUB 1OOnm PARTICLE REMOVAL WITH DEIONIZED WATER AND A MEGASONIC FREQUENCY OF 835kHz

Author(s):
Lauerhaas, J.
Wu, Y.
Xu, K.
Vereecke, G.
Vos, R.
Kenis, K.
Mertens, P.
Nicolosi, T.
Heyns, M.
4 more
Publication title:
Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-26
Pub. Year:
2001
Page(from):
147
Page(to):
155
Pages:
9
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773591 [1566773598]
Language:
English
Call no.:
E23400/200126
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings EVALUATION OF MEGASONIC CLEANING SYSTEMS FOR PARTICLE REMOVAL EFFICIENCY AND DAMAGING

Vereecke, G., Holsteyns, F., Veltens, J., Lux, M., Amauts, S., Kenis, K., Vos, R., Mertens, P., Heyns, M.

Electrochemical Society
7 Conference Proceedings SELECTIVE ETCHING OF SiGe FOR REMOVAL OF DUMMY LAYERS IN FULLY SILICIDED GATE ARCHITECTURES

J. Snow, R. Vos, K. G. Anil, H. Kraus, K. Xu, F. Grinninger, G. Wagner, F. Kovacs, P. W. Mertens

Electrochemical Society
2 Conference Proceedings MECHANISMS OF PARTICLE REMOVAL DURING BRUSH SCRUBBER CLEANING

Xu, K., Vos, R., Vereecke, G., Mertens, P., Heyns, M., Vinckier, C., Fransaer, J.

Electrochemical Society
8 Conference Proceedings Studies of the Relationship Between Megasonics, Surface Etching, and Particle Removal in SC-1 Solutions

Cohen, S. L., Rath, D., Lee, G., Furman, B., Pope, K. R., Tsai, R., Syverson, W., Gow, C., Liehr, M.

MRS - Materials Research Society
3 Conference Proceedings EVALUATION OF MEGASONIC CLEANING PROCESSES

Holsteyns, F., Riskin, A., Maes, A., Vereecke, G., Mertens, P.W.

Electrochemical Society
9 Conference Proceedings Effect of Metal Contamination and Improved Cleaning Strategies

Mertens, P.W., Bearda, T., Lowewenstein, L.M., Martin, A.R., Hub, W., Kolbesen, B.O., Teerlink, I., Vos, R., Baeyens, …

Electrochemical Society
4 Conference Proceedings OPTIMIZATION OF A BRUSH SCRUBBER FOR NANO-SIZED PARTICLES

Xu, K., Vos, R., Arnauts, S., Lux, M., Schaetzlein, W., Speh, U., Mertens, P., Heyns, M., Vinckier, C.

Electrochemical Society
10 Conference Proceedings A DESIGN OF EXPERIMENTS APPROACH TO AN OPTIMIZED SC-1/MEGASONIC CLEAN FOR SUB-0.15 MICRON PARTICLE REMOVAL

Resnick, P.J., Adkins, C.L.J., Clews, P.J., Thomas, E.V., Cannaday, S.T.

Electrochemical Society
5 Conference Proceedings EFFECTIVE POST-ETCH RESIDUE REMOVAL ON LOW-K FILMS USING SINGLE WAFER PROCESSING

Kesters, E., Ghekiere, J., Van Doorne, P., Vereecke, G., Mertens, P.W., Heyns, M.M.

Electrochemical Society
11 Conference Proceedings CORROSION OF ALUMINUM ALLOYS DURING DRYING OF METALLIZED WAFERS

Vos, R., Meuris, M., Mertens, P., Heyns, M., Hatcher, Z.

Electrochemical Society
6 Conference Proceedings Local Removal Frequency of Nano Particles in Megasonic Cleaning

T. Janssens, K.L. Wostyn, S. Arnauts, A. De Geyter, T. Bearda

Electrochemical Society
12 Conference Proceedings QUANTITATIVE MODELING OF H2O2 DECOMPOSITION IN SC1

Mertens, P., Baeyens, M., Moyaerts, G., Okorn-Schmidt, H., Vos, R., De Waele, R., Hatcher, Z., Hub, W., De Gendt, S., …

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12