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Plasma Charging Damage Performance Assessment with Scaled-up Process from 200 mm to 300 mm Dielectric Etch Chambers

Author(s):
Ma, S.
Bjorkman, C.
Mays, B.
Kropwenicki, T.
Feng, T.
Li, Q.
Dadu, U.
Chang, M.
Shan, H.
4 more
Publication title:
Thin film materials, processes, and reliability : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-24
Pub. Year:
2001
Page(from):
14
Page(to):
22
Pages:
9
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773577 [1566773571]
Language:
English
Call no.:
E23400/200124
Type:
Conference Proceedings

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