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Modeling Analysis of Gas-Phase Generated Silicon Clusters in a Rotating Disk CVD Reactor

Author(s):
Publication title:
Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-13
Pub. date:
2001
Page(from):
462
Page(to):
467
Pages:
6
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773195 [1566773199]
Language:
English
Call no.:
E23400/200113
Type:
Conference Proceedings

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