Near-Infrared Diode Laser In Situ Monitoring and Control of Chemical Vapor Deposition Processes

Near-Infrared Diode Laser In Situ Monitoring and Control of Chemical Vapor Deposition Processes

Author(s):

Publication title:

Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2001-13

Pub. date:

2001

Page(from):

176

Page(to):

182

Pages:

7

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773195 [1566773199]

Language:

English

Call no.:

E23400/200113

Type:

Conference Proceedings

Details

TDL ID:	ZA00014016
Series ID:	PA00000028
Conf. info. (Name):	Fundamental Gas-Phase and Surface Chemistry of Vaper-Phase Materials Synthesis ; Symposium on Process Control, Diagnostics and Modeling in Semiconductor Manufacturing
Conf. info. (Number):	2nd ; 4th
Conf. info. (Venue):	Washington, D.C., USA
Conf. info. (Date):	2001.00.00

Similar Items:

1 Conference Proceedings Deposition of Thin Film Transition Metal Oxides (TMO) on Glass by Combustion Chemical Vapour Deposition (C-CVD) Benito, G., Davis, M.J., Hurst, S.J., Sheel, D.W., Pemble, M.F. Electrochemical Society	7 Conference Proceedings Ultrasensitive diode-laser-based monitor for singlet oxygen Davis, S.J., Zhu, L., Minhaj, A.M., Hinds, M.F., Lee, S., Keating, P.B., Rosen, D.I., Hasan, T. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Atmospheric-Pressure Plasma-Enhanced Chemical Vapour Deposition (AP-PE-CVD) for Growth of Thin Films at Low Temperature Davis, M.J., Tsanos, M., Lewis, J., Sheel, D.W., Pemble, M.E. Electrochemical Society	8 Conference Proceedings IN SITU CONTROL OF ENERGY BANDGAP BY LASER ENHANCED METALOGANIC CHEMICAL VAPOR DEPOSITION Epler, J.E., Chung, H.F., Treat, D.W., Paoli, T.L. Materials Research Society
3 Conference Proceedings IN SITU CONTAMINATION CONTROL INVESTIGATION OF SILICON NITRIDE LOW PRESSURE CHEMICAL VAPOR DEPOSITION PROCESS IN VERTICAL THERMAL REACTORS Moinpour, Mansour, Bohannan, K., Shenasa, M., Sharif, A., Guzzo, G., Brestovansky, D.F., Markle, R.J., Wilkes, R. Materials Research Society	9 Conference Proceedings Atmospheric pressure glow discharge CVD of TiO2 thin fihns Hodgtinson, J. L., Sheel, D. W., Yates, H. M., Davis, M. J., Pemble, M. E. Electrochemical Society
4 Conference Proceedings Diode laser-based sensors for chemical oxygen iodine lasers Davis,S.J., Allen,M.G., Kessler,W.J., McManus,K.R., Miller,M.F., Mulhall,P.A. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Near-IR diode-laser-based sensor for parts-per-billion-level water vapor in industrial gases Kessler,W.J., Allen,M.G., Davis,S.J., Mulhall,P.A., Polex,J.A. SPIE - The International Society for Optical Engineering
5 Conference Proceedings Characterization of Vanadium Oxide Films Prepared by Atmospheric Pressure Chemical Vapour Deposition Vernardou, D., Pemble, M.E., Sheel, D., M Ivan, T.D., Parkin, P. Electrochemical Society	11 Conference Proceedings Multi-wavelength fransmittance photoplethysmograpy with near infrared laser diodes during exercise [5862-38] Silva, L-pez S.M., Giannetti, R., Dotor, M. L., Golmayo, D., Martin, P., Miguel-Tobal, F., Bilbao, A., Silveira, J. P. SPIE - The International Society of Optical Engineering
6 Conference Proceedings In-Situ Probing of Atomic Layer Deposition Processes using Infrared and Near Infrared Spectroscopy A. O'Mahony, I.M. Povey, M.E. Pemble Electrochemical Society	12 Conference Proceedings DPAL: a new class of CW near-infrared high-power diode-pumped alkali (vapor) lasers Krupke, W.F., Beach, R.J., Kanz, V.K., Payne, S.A. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12