High Performance SOI CMOS Technology: FEOL Process, Device, and Material Interactions

High Performance SOI CMOS Technology: FEOL Process, Device, and Material Interactions

Author(s):: Mendicino, M.
Publication title:: Rapid thermal and other short-time processing technologies II : proceedings of the international symposium
Title of ser.:: Electrochemical Society Proceedings Series
Ser. no.:: 2001-9
Pub. Year:: 2001
Page(from):: 409
Page(to):: 420
Pages:: 12
Pub. info.:: Pennington, NJ: Electrochemical Society
ISSN:: 01616374
ISBN:: 9781566773157 [1566773156]
Language:: English
Call no.:: E23400/2001-9
Type:: Conference Proceedings

Details

TDL ID:	ZA00014012
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Rapid Thermal and Other Short-Time Processing Technologies ; Meeting of the Electrochemical Society
Conf. info. (Number):	2nd ; 199th
Conf. info. (Venue):	Washington D.C., USA
Conf. info. (Date):	2001.03.24-2001.03.29

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