Ultra-Shallow Junction Formation Via Thermal diffusion of Boron into High Energy Ion Irradiated Silicon
- Author(s):
- Publication title:
- Rapid thermal and other short-time processing technologies II : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2001-9
- Pub. Year:
- 2001
- Page(from):
- 305
- Page(to):
- 310
- Pages:
- 6
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773157 [1566773156]
- Language:
- English
- Call no.:
- E23400/2001-9
- Type:
- Conference Proceedings
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