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* Ultra Thin High-K Dielectrics Grown by Atomic Layer Deposition: A Comparative Study of ZrO2, HfO2, Y2O3 and Al2O3

Author(s):
Gusev, E.P.
Canter, E.
Copel, M.
Gribelyuk, M.
Buchanan, D.A.
Okorn-Schmidt, H.
D'Emic, C.
Kozlowski, P.
Tuominen, M.
Linnermo, M.
Haukka, S.
6 more
Publication title:
Rapid thermal and other short-time processing technologies II : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-9
Pub. Year:
2001
Page(from):
189
Page(to):
196
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773157 [1566773156]
Language:
English
Call no.:
E23400/2001-9
Type:
Conference Proceedings

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