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Preparation of Sub 20A Thick Ultra-Thin Stack Gate Dielectrics by In-situ RTCVD Processes

Author(s):
Publication title:
Rapid thermal and other short-time processing technologies II : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-9
Pub. date:
2001
Page(from):
183
Page(to):
188
Pages:
6
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773157 [1566773156]
Language:
English
Call no.:
E23400/2001-9
Type:
Conference Proceedings

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