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Multiple Spike RTP Process for Forming Ultra Thin Oxides for MOS Gate Dielectric Application

Author(s):
Das, J.H.
Jia, Y.B.
Choi, J.Y.
Daniel, A.D.
Atanos, A.J.
Tay, S.P.
1 more
Publication title:
Rapid thermal and other short-time processing technologies II : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-9
Pub. Year:
2001
Page(from):
147
Page(to):
156
Pages:
10
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773157 [1566773156]
Language:
English
Call no.:
E23400/2001-9
Type:
Conference Proceedings

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