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Determination of Silicon Film Doping Concentration and Back Oxide Charge Density using SOI-MOS Capacitor

Author(s):
Publication title:
Silicon-on-Insulator Technology and Devices X : proceedings of the tenth International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-3
Pub. date:
2001
Page(from):
109
Page(to):
114
Pages:
6
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773096 [1566773091]
Language:
English
Call no.:
E23400/2001-3
Type:
Conference Proceedings

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