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A Study on the Solid Phase Reaction and Thermal Stability in the Ni-Sil-x Gex System Using Rapid Thermal Annealing (RTA) Process

Author(s):
Choi, H.-J.
Kim, H.-Y.
Ko, D.-H.
Ku, J.-H.
Choi, C.-J.
Choi, S.
Fujihara, K.
Kang, H.K.
Yang, M-H.
Yang, C.-W.
5 more
Publication title:
ULSI Process Integration : proceedings of the International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-2
Pub. Year:
2001
Page(from):
591
Page(to):
600
Pages:
10
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773089 [1566773083]
Language:
English
Call no.:
E23400/2001-2
Type:
Conference Proceedings

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