Enhanced Short-Channel Effects of Sub-50 nm Gate Length MOSFETs with High-k Gate Insulator Films
- Author(s):
Fujimura, R. Takeda, M. Sato, K. Ohmi, S.-I. Ishiwara, H. Iwai, H. - Publication title:
- ULSI Process Integration : proceedings of the International Symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2001-2
- Pub. Year:
- 2001
- Page(from):
- 313
- Page(to):
- 323
- Pages:
- 11
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773089 [1566773083]
- Language:
- English
- Call no.:
- E23400/2001-2
- Type:
- Conference Proceedings
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