SiGe HBT/CMOS Technology for RF and High-Speed Digital Applications*

SiGe HBT/CMOS Technology for RF and High-Speed Digital Applications*

Author(s):: Washio, K.
Publication title:: ULSI Process Integration : proceedings of the International Symposium
Title of ser.:: Electrochemical Society Proceedings Series
Ser. no.:: 2001-2
Pub. Year:: 2001
Page(from):: 155
Page(to):: 164
Pages:: 10
Pub. info.:: Pennington, N.J.: Electrochemical Society
ISSN:: 01616374
ISBN:: 9781566773089 [1566773083]
Language:: English
Call no.:: E23400/2001-2
Type:: Conference Proceedings

Details

TDL ID:	ZA00014006
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on ULSI Process Integration ; Meeting of the Electrochemical Society
Conf. info. (Number):	2nd ; 199th
Conf. info. (Venue):	Washington, D.C., USA
Conf. info. (Date):	2001.03.24-2001.03.31

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