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Copper Stable Isotope Spike Method as A Tool for Low Temperature Out-Diffusion of Copper in P-Type Silicon

Author(s):
Publication title:
High Purity Silicon VI : proceedings of the sixth International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-17
Pub. Year:
2000
Page(from):
287
Page(to):
295
Pages:
9
Pub. info.:
Bellingham, Wash.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772846 [1566772842]
Language:
English
Call no.:
E23400/200017
Type:
Conference Proceedings

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