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Oxygen Precipitation Behavior and its Optimum Condition for Internal Gettenng and Mechanical Strength in Epitaxial and Polished Silicon Wafers *

Author(s):
Sueoka, K.
Akatsuka, M.
Onno, T.
Asayama, E.
Koike, Y.
Adachi, N.
Sadamitsu, S.
Katahama, H.
3 more
Publication title:
High Purity Silicon VI : proceedings of the sixth International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-17
Pub. date:
2000
Page(from):
164
Page(to):
179
Pages:
16
Pub. info.:
Bellingham, Wash.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772846 [1566772842]
Language:
English
Call no.:
E23400/200017
Type:
Conference Proceedings

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