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Growth Kinetics and Mechanistic Studies of GaN Thin Films Grown by OMVPE Using (N3)2Ga[(CH2)3NMe2] as Single Source Precursor

Author(s):
Wohlforr, A.
Devi, A.
Rogge, W.
Fischer, R.A.
Schaefer, J.
Wolfrum, J.
Allendorf, M.D.
2 more
Publication title:
CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-13
Pub. Year:
2000
Page(from):
697
Page(to):
706
Pages:
10
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772785 [1566772788]
Language:
English
Call no.:
E23400/200013
Type:
Conference Proceedings

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