Atomic Layer Deposition of Metal Oxide Films by using Metal Alkoxides as an Oxygen Source

Atomic Layer Deposition of Metal Oxide Films by using Metal Alkoxides as an Oxygen Source

Author(s):

Publication title:

CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2000-13

Pub. Year:

2000

Page(from):

623

Page(to):

628

Pages:

6

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772785 [1566772788]

Language:

English

Call no.:

E23400/200013

Type:

Conference Proceedings

Details

TDL ID:	ZA00013982
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Chemical Vapor Deposition - CVD
Conf. info. (Number):	15th
Conf. info. (Venue):	Tronto, Ontario, Canada
Conf. info. (Date):	2000.05.14-2000.05.18

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