Blank Cover Image

Chemical Vapor Deposition of Titanium Nitride and Titanium Silicon Nitride Thin Films from Tetrakis-(dimethylamido)Titanium and Hydrazine as a Co-Reactant

Author(s):
Publication title:
CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-13
Pub. Year:
2000
Page(from):
497
Page(to):
504
Pages:
8
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772785 [1566772788]
Language:
English
Call no.:
E23400/200013
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Low temperature chemical vapor deposition of titanium nitride thin films with hydrazine and tetrakis-(dimethylamide)titanium

Amato-Wierda, Carmela, Norton, Edward T. Jr., Wierda, Derk A.

MRS-Materials Research Society
7 Conference Proceedings Chemical rate model for the surface pyrolysis of tetrakis (dimethylamido) titanium to form titanium nitride films

Toprac,A.J., Iacoponi,J.A., Littau,K.A.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Chemical Vapor Deposition of Hard Coatings Part 1: Ti-W-C by TiCl4 + W(CO)6 + CH4 and Part 2: TiCN and TiN from Tetrakis (Dimethylamido) Titanium

Ji, H., Delisle, D., Biais, C., Amato-Wierda, C.

Electrochemical Society
8 Conference Proceedings Electrical Properties of TiN Films Prepared by Plasma Assisted Atomic Layer Deposition Using Tetrakis(Dimethylamido)-Titanium

Kim, D.-H., Kim, Y.J., Song, Y.S.

Electrochemical Society
3 Conference Proceedings Kinetics and Mechanism of the Thermal Decomposition of Tetrakis (Dimethylamino) Titanium

Norton., E., Jr., Amato-Wierda, C.

Electrochemical Society
9 Conference Proceedings Characteristics of Silicon Oxy-Nitride Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition

Valade, L., deCaro, D., Casellas, H., Basso-Bert, M., Faulmann, C., Legros, I-P., Gassoux, P., Aries, L.

Electrochemical Society
4 Conference Proceedings Aspects of gas phase chemistry during chemical vapor deposition of Ti-Si-N thin films with Ti(NMe2)4(TDMAT), NH3, and SiH4

Amato-Wierda, Carmela, Norton, Edward T. Jr., Wierda, Derk A.

MRS-Materials Research Society
10 Conference Proceedings Kinetic and Mechanistic Studies of the Chemical Vapor Deposition of Ti-Si-N Thin Filnss with Ti(NMe2)4(TDMAT), NH3, and Si H4

Nortot, E.T., Wierda, C.Antctto-

Electrochemical Society
5 Conference Proceedings Molecular beam mass spectrometry studies of the thermal decomposition of tetrakis(dimethylamino)titanium

Amato-Wierda, Carmela C., Norton, Edward T. Jr., Wierda, Derk A.

MRS-Materials Research Society
11 Conference Proceedings Precursors for the Chemical Vapor Deposition of Titanium Nitride and Titanium Aluminum Nitride Films

Winter, Charles H., McKarns, Peggy J., Scheper, Joseph T.

MRS - Materials Research Society
6 Conference Proceedings IN SITU XPS STUDIES OF THE DEPOSITION OF THIN FILMS FROM TETRAKIS(DIMETHYLAMIDO)TITANIUM ORGANOMETALLIC PRECURSOR FOR DIFFUSION BARRIERS

Ruhl, G., Rehmet, R., Knizova, M., Veprek, S.

MRS - Materials Research Society
12 Conference Proceedings Molecular Beam Mass Spectronactry Studies of the Thermal Decomposition of Tetrakis(Dinsethylamino)Titattium

Wierda, C.C.Amato-, Norton, E.T., Jr

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12