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A Stagnation-Flow MOCVD Reactor for Intelligent Deposition of YBCO Thin Films

Author(s):
Tripathi, A.
Boyd, D.
Gallivait, M.
Atsvater, H.
Murray, R.
Goodwin, D.
Raja, L.R.
Kee, R.J.
Musoif, J.
4 more
Publication title:
CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-13
Pub. Year:
2000
Page(from):
240
Page(to):
247
Pages:
8
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772785 [1566772788]
Language:
English
Call no.:
E23400/200013
Type:
Conference Proceedings

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