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Numerical Simulation of Silicon Carbide Deposition in a Cold Wall CVD Reactor

Author(s):
Chaix, G.
Dallet, A.
Matecki, M.
de Persis, S.
Wang, Y.
Teyssandier, F.
1 more
Publication title:
CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-13
Pub. Year:
2000
Page(from):
209
Page(to):
215
Pages:
7
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772785 [1566772788]
Language:
English
Call no.:
E23400/200013
Type:
Conference Proceedings

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