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Processing and Characterization of RTCVD Silicon Nitride and Oxynitride Grown in a Single-Wafer RT Cluster Tool

Author(s):
D'Emic, C.P.
Gusev, E.P.
Newbury, I.
Kozlowski, P.
Chan, K.
Zabel, T.
Varekamp, P.
2 more
Publication title:
Rapid thermal and other short-time processing technologies : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-9
Pub. Year:
2000
Page(from):
247
Page(to):
154
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772747 [1566772745]
Language:
English
Call no.:
E23400/2000-9
Type:
Conference Proceedings

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