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In-situ Rapid Thermal N20 Oxidation of NH3-Nitrided Si for Ultrathin Nitride/Oxide Stack Gate Formation

Author(s):
Kim, Y.H.
Song, S.C.
Luan, H.F.
Gelpey, J.C.
Kepton, A.
Levy, S.
Bloom, R.
Kwong, D.-L.
3 more
Publication title:
Rapid thermal and other short-time processing technologies : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-9
Pub. Year:
2000
Page(from):
239
Page(to):
246
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772747 [1566772745]
Language:
English
Call no.:
E23400/2000-9
Type:
Conference Proceedings

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