Blank Cover Image

Gate Dielectrics Formed by Remote Plasma Nitridaion of Ultrathin In-Situ Steam Generated (ISSG) Oxides

Author(s):
Watt, V.H.C.
Torres, K.
Jackson, M.D.
Huff, H.R.
Abmed, K.
Jallepally, R.
Noble, D.
Toni, N.
Miner, G.
4 more
Publication title:
Rapid thermal and other short-time processing technologies : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-9
Pub. Year:
2000
Page(from):
231
Page(to):
238
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772747 [1566772745]
Language:
English
Call no.:
E23400/2000-9
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Remote Plasma Nitridation of In Situ Steam Generated (ISSG) Oxide

Al-Shareef, Husam N., Karamcheti, A., Luo, T.T., Brown, G.A., Watt, V.H.C., Jackson, M.D., Huff, H.R., Jallepally, R., …

Materials Research Society
7 Conference Proceedings Prospective technology for system-on-a-chip: N2 implant followed by VHP O2 reoxidation

Luo,T.Y., Al-Shareef,H.N., Brown,G.A., Watt,V.H.C., Karamcheti,A., Jackson,M.D., Huff,H.R., Evans,B., Lee,C.H., …

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Ultrathin CVD Gate Dielectrics for 130 nm Technology Node

Watt, V.H.C., Karamcheti, A., Luo, T.-Y, Al-Shareef, H.N., Jackson, M.D., Huff, H.R.

Electrochemical Society
8 Conference Proceedings Influence of the Standard CMOS Procesing on Ta2O5 Gate Dielectric Transistors Performance

Bersuker, G., Gilmer, M., Zeitzoff, P.M., Brown, G.A., Jackson, M.D., Shaapur, F., Foran, B., Huff, H.R.

Electrochemical Society
3 Conference Proceedings Correlation between the reliability of ultrathin ISSG SiO2 and hydrogen content

Luo,T.Y., Al-Shareef,H.N., Brown,G.A., Laughery,M., Watt,V.H.C., Karamcheti,A., Jackson,M.D., Huff,H.R.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings High Performance, Highly Reliable Gate Oxide Formed with Rapid Thermal Oxidation In-Situ Steam Generation (ISSG) Technique

Ma, Y., Chen, Y.N., Brown, M.M, Li, F., Chen, Y., Eng, J., Jr., Opila, R.L., Chabal, Y.J., Sapjeta, J., Muller, D.A., …

Electrochemical Society
4 Conference Proceedings Investigation of In-Situ Steam Generated Oxide (ISSG) followed by Remote Plasma Nitridation (RPN) for Effective Oxide Thickness Decrease and Gate Leakage …

Eason, K., Jallepally, R., Noble, D., Hattangady, S., Khamankar, R., Rotondaro, A.L.P.

Electrochemical Society
10 Conference Proceedings A Novel Method for Selective Oxidation of W/WNx/Poly Gate Stack Using RTP ISSG Techniques

Joo, H.S., Ng, B., Lopes, D., Miner, G.

Electrochemical Society
5 Conference Proceedings Development of Silicon Nitride Films for Gate Dielectric Applications

Brady, D., Watt, V.H.C., Karamcheti, A., Vishnubhotla, L., Bersuker, G., Kim, S., Zietzoff, P., Gilmer, M., Guan, J., …

Electrochemical Society
11 Conference Proceedings Remote plasma nitrided oxides for ultrathin gate dielectric applications (Invited Paper)

Hattangady,S.V., Grider,O.T., Kraft,R., Shiau,W.-T., Douglas,M.A., Nicollian,P., Rodder,M., Brown,G.A., Chatterjee,A., …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Electrical and physical characterization of ultrathin silicon oxynitride gate dielectric films formed by the jet vapor deposition technique

Karamcheti, A., Watt, V. H. C., Luo, T. Y., Brady, D., Shaapur, F., Vishnubhotla, L., Gale, G., Huff, H. R., Jackson, M. …

MRS-Materials Research Society
12 Conference Proceedings Process and Manufacturing Challenges for High-K Gate Stack Systems

Gilmer, M. C., Luo, T-Y., Huff, H. R., Jackson, M. D., Kim, S., Bersuker, G., Zeitzoff, P., Vishnubhotla, L., Brown, G. …

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12