Encroachment on Silicon Substrate by PECVD Deposited Tungsten at Low Temperatures and the Effect of WF5 on Selectivity
- Author(s):
- Publication title:
- Plasma processing XIII : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2000-6
- Pub. Year:
- 2000
- Page(from):
- 80
- Page(to):
- 89
- Pages:
- 10
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772716 [1566772710]
- Language:
- English
- Call no.:
- E23400/2000-6
- Type:
- Conference Proceedings
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