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Influence of the Standard CMOS Procesing on Ta2O5 Gate Dielectric Transistors Performance

Author(s):
Bersuker, G. ( (SEMA TECH) )
Gilmer, M. ( (SEMA TECH) )
Zeitzoff, P.M. ( (SEMA TECH) )
Brown, G.A. ( (SEMA TECH) )
Jackson, M.D. ( (SEMA TECH) )
Shaapur, F. ( (SEMA TECH) )
Foran, B. ( (SEMA TECH) )
Huff, H.R. ( (SEMA TECH) )
3 more
Publication title:
Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-5
Pub. Year:
2000
Page(from):
178
Page(to):
186
Pages:
9
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772709 [1566772702]
Language:
English
Call no.:
E23400/2000-5
Type:
Conference Proceedings

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