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The Influence of Temperature on the Deposition of Low-k Films by PECVD of Trimethylsilane

Author(s):
Publication title:
Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-5
Pub. Year:
2000
Page(from):
63
Page(to):
71
Pages:
9
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772709 [1566772702]
Language:
English
Call no.:
E23400/2000-5
Type:
Conference Proceedings

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