Integration Issues for New Dielectrics in CMOS Technology
- Author(s):
Gates, S. ( (IBM) ) Chen, S.T. ( (IBM) ) Chen, X. ( (IBM) ) Cohen, S. ( (IBM) ) Edelstein, D. ( (IBM) ) Fitzsimmons, J. ( (IBM) ) Hedrick, J. ( (IBM) ) Restaino, D. ( (IBM) ) Ryan, J. ( (IBM) ) Simonyi, E. ( (IBM) ) Purushothaman, S. ( (IBM) ) - Publication title:
- Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2000-5
- Pub. Year:
- 2000
- Page(from):
- 31
- Page(to):
- 39
- Pages:
- 9
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772709 [1566772702]
- Language:
- English
- Call no.:
- E23400/2000-5
- Type:
- Conference Proceedings
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