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Characterization of Oxynitride Dielectric Films Grown in NO/O2 Mixtures by Rapid Thermal Oxynitridation

Author(s):
Everist, S.C.
Meisenheimer, T.L.
Nelson, G.C.
Smith, P.M.
Sharangpani, R.
Tay, S.-P.
1 more
Publication title:
The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-2
Pub. Year:
2000
Page(from):
131
Page(to):
144
Pages:
14
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772679 [1566772672]
Language:
English
Call no.:
E23400/2000-2
Type:
Conference Proceedings

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