Blank Cover Image

Growth Mechanism of SiO2 Ultra-Thin Film on Si(100) by Highly Concentrated Ozone Supplied at Low and High Pressure Conditions

Author(s):
Publication title:
The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-2
Pub. date:
2000
Page(from):
67
Page(to):
78
Pages:
12
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772679 [1566772672]
Language:
English
Call no.:
E23400/2000-2
Type:
Conference Proceedings

Similar Items:

Koike, K., Inoue, G., Ichimura, S., Nakamura, K., Kurokawa, A., Nonaka, H.

MRS - Materials Research Society

Rashid, Riyaz, Flewitt, A.J., Robertson, John, Milne, W.I.

Electrochemical Society

Kurokawa, A., Maeda, T., Sakamoto, K., Itoh, H., Nakamura, K., Koike, K., Moon, D. W., Ha, Y. H., Ichimura, S., Ando, A.

MRS - Materials Research Society

Nonaka, H., Kurokawa, A., Ichimura, S., Moon, D. W.

MRS - Materials Research Society

Nonaka, H., Kurokawa, A., Nakamura, K., Ichimura, S.

MRS - Materials Research Society

Liu, X.H., Peng, H.J., Wong, S.P., Zhao, Shounan

Materials Research Society

Kurokawa, A., Ichimura, S., Moon, D. W.

MRS - Materials Research Society

Hou, S. Y., Werder, D. J., Phillips, Julia M., Marshall, J. H.

MRS - Materials Research Society

Kurokawa, A., Ichimura, S., Kang, H. J., Moon, D. W.

MRS - Materials Research Society

Hisada, M., Nakamura, S., Hosoki, A.

Electrochemical Society

Kurokawa, Akira, Nakamura, Ken, Ichimura, Shingo

MRS - Materials Research Society

Bakin, A.S., Ivanov, A., Hisada, K., Riedl, T., Hitzel, F., Wehmann, H.-H., Schlachetzki, A.

Trans Tech Publications

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12