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A Quantitative Model for Oxide Erosion in Chemical Mechanical Polishing of Tungsten

Author(s):
Yoon, B.U.
Jeong, I.K
Kim, J.Y.
Lee, J.W.
Hah, S.R.
Moon, J.T.
Lee, S.I.
2 more
Publication title:
Chemical mechanical planariarization in IC device manufacturing III : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-37
Pub. date:
1999
Page(from):
616
Page(to):
624
Pages:
9
Pub. info.:
Pennington, N. J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772600 [1566772605]
Language:
English
Call no.:
E23400/99-37
Type:
Conference Proceedings

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