Study of Slurry Chemistry in Chemical Mechanical Polishing (CMP) of Copper
- Author(s):
- Publication title:
- Chemical mechanical planariarization in IC device manufacturing III : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 99-37
- Pub. Year:
- 1999
- Page(from):
- 187
- Page(to):
- 192
- Pages:
- 6
- Pub. info.:
- Pennington, N. J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772600 [1566772605]
- Language:
- English
- Call no.:
- E23400/99-37
- Type:
- Conference Proceedings
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