HF CONCENTRATION OF CONTROL IN IC MANUFACTURING
- Author(s):
- Publication title:
- Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 99-36
- Pub. Year:
- 1999
- Page(from):
- 252
- Page(to):
- 257
- Pages:
- 6
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772594 [1566772591]
- Language:
- English
- Call no.:
- E23400/99-36
- Type:
- Conference Proceedings
Similar Items:
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
10
Conference Proceedings
Maintaining a Stable Etch Selectivity between Silicon Nitride and Silicon Dioxide in a Hot Phosphoric Acid Bath
Electrochemical Society |
5
Conference Proceedings
In Situ Chemical Concentration Monitoring and Control of HF Oxide Etch Processes
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |